The Era of MRAM
The Era of MRAM
  • Lee Geon-yong(News Editor)
  • 승인 2026.09.08 16:35
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Combining the lightning speed of DRAM with the permanent storage of NAND flash, MRAM is emerging as the next-generation memory savior for the AI era. Here is how magnetic semiconductor tech aims to overcome high production costs and scaling limits.

             Surging demand driven by the rapid expansion of AI industry and data centers has pushed up prices for Dynamic Random Access Memory (MRAM). It forces the tech industry to search for next generation alternatives as chip scaling approaches its physical limits. With manufacturing costs escalating alongside miniaturizing challenges, Magneto-resistive Random Access Memory (MRAM), a is gaining renewed attention as a potential game changer in the global memory semiconductor market.

 

Combining Speed and Persistence

             Unlike conventional memory devices that store using electrical charges, MRAM relies on magnetic properties to retain information. Standard DRAM records binary digits (0s and 1s) by charging or discharging electrons in tiny capacitors. Because these electrons leak over time, DRAM requires continuous power refreshing to maintain data, making it inherently volatile.

             MRAM, in contrast, writes data by altering the magnetic polarization (North and South poles) of microscopic magnetic layers. Because it harnesses magnetism, the memory retains its state even when the power supply is cut off. This non-volatile nature allows MRAM to bridge the gap between DRAM and NAND flash, combining the high read/write speeds of DRAM with the persistent storage capabilities of NAND.

 

Manufacturing Hurdles and Cost Barriers

             Despite its theoretical advantages, MRAM has yet to replace DRAM in mass-market consumer electronics such as smartphones and personal computers, primarily due to high production costs and complex manufacturing processes. While decades of process scaling have allowed DRAM manufacturers to integrate tens of billions of cells onto a single tiny chip, drastically driving down unit costs fabricating MRAM remains highly intricate. The core storage element, the Magnetic Tunnel Junction (MTJ), presents severe fabrication challenges.

             Magnetic materials are far more difficult to etch cleanly than standard silicon substrates. Furthermore, increasing memory density creates electromagnetic interference between closely packed cells, making the chips susceptible to data errors.

             Although major global foundries have successfully brought MRAM into commercial production, the technology remains largely restricted to small-scale embedded applications within larger logic chips. Achieving high-capacity, standalone mass production at competitive yields remains a formidable hurdle for the semiconductor industry.

 

Lee Geon-yong (News Editor)

rjsdyd0414@soongsil.co.kr



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